RF Ion Source

Beam Imaging Solutions (BIS) presents the new model RFIS-100 ion source assembly. The RFIS-100 is designed to be retrofittable to the standard model G-1 and G-2 ion gun accelerator systems. The ion source operates with a RF power supply at 13.56 MHz with manual adjust match network to produce an inductively coupled plasma (ICP). The RF ion source offers many benefits over the standard Colutron hot cathode DC discharge source including much longer operating time between maintenance, especially with oxygen and reactive gasses, and also higher beam currents.

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Product Overview

Beam Imaging Solutions (BIS) presents the new model RFIS-100 ion source assembly. The RFIS-100 is designed to be retrofittable to the standard model G-1 and G-2 ion gun accelerator systems. The ion source operates with a RF power supply at 13.56 MHz with manual adjust match network to produce an inductively coupled plasma (ICP). The RF ion source offers many benefits over the standard Colutron hot cathode DC discharge source including much longer operating time between maintenance, especially with oxygen and reactive gasses, and also higher beam currents. In addition to being able to produce ions from gasses, the new ion source has the added capability of producing metal ions by sputtering the source gas with a metal target in the discharge chamber. Customers that do not already own a Colutron ion gun can purchase the new source to fit to their own ion accelerator systems. Customers that have the Colutron ion gun would remove the standard Colutron DC ion source and heat sink assembly from the ion gun and attach the RF ion source directly to the Colutron model 500 insulator flange. The RF source does not require the Colutron heat sink to operate.

Composition

1. RFIS-101 Ion Source Assembly (See picture above). To minimize down time, a fresh RFIS-101 assembly can be switched out very quickly with a used unit that might require cleaning and/or servicing.

2. RFIS-007 Ion Source Flange. The source flange has two VCR water feedthrough connections for the RF antenna, and 50 ohm BNC connection for an optional sputter target connection, as well as a 12kV high voltage feedthrough for an electric start circuit.

3. RFIS-010 Gas Isolator. To prevent the plasma from shorting to the ion source flange, a specially designed high voltage gas break has been utilized allowing up to 10kV isolation. The gas isolator is attached to the RFIS-007 ion source flange via a 1/8″ swagelok fitting.

3. RFMB-100 MRF Match Box. The RF Match box houses the high current and high voltage vacuum variable capacitors needed for proper tuning of the RF antenna, as well as gas, water and electrical connections required for source operation. The match box also houses the new high voltage arc supply for simple electric push button starting of the ion source plasma.

4. RFMB-200 High Voltage Safety Enclosure. The RFIS-100 package also includes a plexiglas enclosure to ensure operator safety during high voltage operation of the ion source. A fan is incorporated into the enclosure to provide additional cooling of the ion source.